Metal Sputtering Targets Gr1 Gr2 Gr5 Titanium Sputtering Silver Sputtering Target For PVD Vacuum Coating Machine
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.../32/35/40/42/45/50(T) Or as customers' requests Surface: bright surface Application: Coating industry, sputtering vacuum coating industry Chemical Requirements: N C H Fe O Al V...
Baoji Lihua Nonferrous Metals Co., Ltd.
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98 X 12mm Dental Implants Titanium Discs Metal Sputtering Target Teeth Crown / Bridge
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... Dental pure titanium disc, due to high purity, low hardness, good toughness, so suitable for movable brackets and fully displaned metal crowns. Gr5 Dental titanium alloy disc,due to the addition of aluminum, vanadium and other elements, improve the...
Baoji City Changsheng Titanium Co.,Ltd
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Zirconium Zr702 High Purity Metal Sputtering Targets
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High Purity Metal Sputtering Targets Zirconium is an active metal with a great affinity for oxygen, and the excellent corrosion resistance of the oxide film determines that it can be competent in multiple corrosive environments. 3. Zirconium has good ......
JINXING MATECH CO LTD
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W-Ti Metal Sputtering Targets Planar Billet For Semiconductor Physical Vapor Depot
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...sputtering target Plate Planar Billet for Semiconductor Physical Vapor Deposition Tungsten-titanium (WTi) films are known to act as the effective diffusion barrier between Al and Si in semiconductor and photovoltaic cells industry. WTifilms are typically deposited as thin films by physical vapor deposition (PVD) through sputtering of a WTialloy target. It is desirable to produce a target......
Luoyang Forged Tungsten-Molybdenum Material Co., Ltd.
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99.99% Pure Titanium Disc 4n High Purity Ti Metal Sputtering Target Low Density
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Pure Titanium 99.99% 4n Disc High Purity Ti Metal Sputtering Target Titanium is metallic and ductile. Sound travels at a rate of 5,090 m/s. The main characteristics of titanium are low density, high mechanical strength and easy processing. The ......
Gnee Steel (tianjin) Co., Ltd.
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Ytterbium Sputtering Target as Advanced OLED Cathode Layer for Brighter , Longer-Lasting Displays
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... ytterbium metal through precision processing, featuring excellent film uniformity, high conductivity, and good sputtering stability. It can replace traditional magnesium and silver cathode materials to improve display device performance and lifespan....
Shanghai Sheeny Metal Mateirals Co.,Ltd.
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3N5 99.95% Molybdenum Sputtering Target For Vacuum Coating
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... There are two kinds of molybdenum sputtering targets:molybdenum planar target and molybdenum rotary target. Molybdenum sputtering target is one kind of industrial material, which is widely used in conductive glass, STN / TN / TFT-LCD, optical glass,...
Zhengzhou Sanhui Refractory Metal Co., Ltd.
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Natural Compound Fused Silica Sputtering Target High Temperature Resistant
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High temperature resistant high quality fused silica sputtering target Silicon dioxide sputtering target contains Si and O. Silicon dioxide (SiO2), also known as Silica, is a natural compound made from two of the most abundant materials on the planet: ......
Yantai ZK Optics Co., Ltd.
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Pulsed Laser Deposition PLD Systems Sputter Target for DC RF Magnetron Sputtering Systems
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... , Compound , and various ceramic target , such as Oxide , Nitride , Carbide , Boride , Sulfide , Selenide and Telluride sputter target .We provide a complete line of sputtering target materials suitable for Pulsed Laser Deposition ( PLD ) systems and...
HENAN ZG INDUSTRIAL PRODUCTS CO.,LTD
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Feiteng Magnetron Cr Sputtering Target OD127*ID458*10
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...Target Pure>3N5 127*458*10 Chromium Sputtering Target Item name Chromium Plate target Size OD127*ID458*10 Pure Pure>3N5 Packaging Vacuum package in wooden case Port of place Xi'an port, Beijing port, Shanghai port, Guangzhou port, Shenzhen port Related product magnetron sputtering target Rotary Target ito rotary target Titanium Rotary Target Vacuum Package Rotary Target titanium sputtering target Vacuum Coating Target......
Baoji Feiteng Metal Materials Co., Ltd.
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